My Research and Inventions

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Sample: D61

AlGaAs waveguide integrated with Co plasmonic waveguide(wavelength=800 nm)

Plasmonic waveguide were fabricated first, electronic lithography (EB) was used. Problem with dielectric waveguides (BCl dry etching)

 

Fabrication technology.

MBE growth on 2010 12

 

Plasmonic waveguide

sputter (SiO2 (6nm;100w, 3’20”) →Co( 70-85nm?; 30min; 200W;Ar 43sccm;0.7Pa )→ Au(200nm;100W;13min)) jetliftoff

sputter (SiO2: 100nm; 200W ) jetliftoff (nozzle 28mm) ICP@bcr (#6; AlGaAs: 215nm; 2’30”; 150w/50w; 1Pa)

sputter (SiO2: 100nm; 200w; 28min)

 

 

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Waveguide technology

 

There was a problem of waveguide fabrication. BCl etching rate of SiO2 was unexpectedly fast.

 

 

cross-sectional SEM of AlGaAs waveguide. 2012 10 31.

 

 

Monolithical Integration

 

 

Top SEM view of integrated AlGaAs waveguide and Co/Au plasmonic waveguides. 2012 10 17.

 

 

 

 

 

 

 

 

Top SEM view of spot size converter and ring resonator. 2012 10 17.

 

 

 

 

 

 

 

Measurements

 

 

 

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